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<type>text</type> <label>Tytuł główny</label> <text> <en>Page title</en> <pl>Fabrication of computer generated holograms using hot embossing nano imprint lithography</pl> </text> textarea Cała treść będzie pogrubiona ^,v,l Description text media media/testdwa image
option <type>text</type> <label>Tytuł</label> <text> <en></en> <pl></pl> </text> textarea * [b]Anna Rojek[sup]1[/sup], Andrzej Kowalik[sup]1[/sup], Jarosław Podgórski[sup]1[/sup][/b][br][hr][br][br]The article presents the investigation to develop a technology for fabricating micro-and nanostructures of a high dimensional precision using the processes of Hot Embossing Nano Imprint Lithography. The research was carried out for three thermoplastic polymers, i.e. poly(methyl methacrylate), olefin copolymer and polycarbonate in order. The process parameters and pattern correction coefficients for shrinkage compensation have been determined. The accuracy better than 1.25 x 10[sup]-3[/sup] % has been reached for the pattern replicated onto olefin copolymer substrates.[br][br][b]Key words:[/b] Hot Embossing Nano Imprint Lithography, nanoimprint, computer generated holograms[br][br][sup]1[/sup] [i]Institute of Electronic Materials Technology, 133 Wólczyńska str., 01-919 Warsaw[/i], Poland [i]e-mail:[/i][email= anna.rojek@itme.edu.pl] anna.rojek@itme.edu.pl[/email][br][hr][br][br][url=http://www.itme.edu.pl/media/_files/ME117.pdf]Download PDF[/url][br]OPEN ACCESS[br]CC-BY 4.0 [br] media media/testdwa media/testdwa image media media/testdwa file option <type>text</type> <label>Tytuł</label> <text> <en></en> <pl></pl> </text> textarea * media media/testdwa media/testdwa image media media/testdwa none option <type>text</type> <label>Nazwa sekcji</label> <text> <en></en> <pl></pl> </text> table
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